What is Block Copolymer Lithography? Block copolymer lithography is a nanofabrication technique that utilizes the self-assembly properties of block copolymers to create ordered nanostructures. Block ...

Block copolymers, comprising two or more chemically distinct polymer segments covalently bonded together, present a versatile framework for the formation of diverse nanostructured materials. The ...

Block copolymers represent an essential class of self-assembling macromolecules, in which chemically distinct segments segregate on the nanoscale to yield a rich array of ordered morphologies. Their ...

(Nanowerk News) Miniaturization is one of the fundamental qualities of modern electronics and is largely responsible for the incredible increments in performance witnessed over the past decades. To ...

A technical paper titled “Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly” was published by researchers at Tokyo Institute of Technology and Tokyo ...

Gentex’s patent describes a medium for electro-optic elements, consisting of two electrochromic block copolymer units. Each unit includes di-block or tri-block copolymers conjugated with donor or ...

The full line of Evoprene styrenic block copolymer compounds, which have been used in Europe for many years in a wide variety of applications, is being introduced to North America for the first time.