The fabrication of nanoscale devices increasingly relies on techniques that offer atomic‐scale precision, with Atomic Layer Deposition (ALD) and Area-Selective Deposition (ASD) at the forefront. ALD ...

Researchers in the United States developed a novel vapor deposition method for all-inorganic perovskite absorbers using continuous flash sublimation (CFS). They described the new technique as a ...

In this interview, discover how ATLANT 3D's DALP technology is revolutionizing thin-film deposition, enabling rapid prototyping and advanced material applications in nanofabrication. Can you please ...

Battery-focused process delivers films as thin as 2 microns, doubles cycle life, scales to gigawatt-level U.S. production TUCSON, Ariz., Sept. 16, 2025 /PRNewswire/ -- Sion Power is making significant ...

Copper’s resistivity depends on its crystal structure, void volume, grain boundaries and material interface mismatch, which becomes more significant at smaller scales. The formation of copper (Cu) ...

Kalpana Systems, a Dutch equipment manufacturer, is launching spatial atomic layer deposition (sALD) tools to be used in roll-to-roll manufacturing processes in the solar PV, organic light emitting ...

Researchers have pioneered a groundbreaking method for the high-speed, large-area deposition of 2D materials. This innovative technique was discovered by chance; however, it promises to revolutionize ...

The term "ALD" was first used around 2000. This technique achieves atomic layer control and conformal deposition through successive, self-limiting surface reactions. It involves introducing chemical ...