A recently developed block copolymer could help push the limits of integration and miniaturization in semiconductor manufacturing, report scientists. Chemically tailored for reliable directed ...

(Nanowerk News) Miniaturization is one of the fundamental qualities of modern electronics and is largely responsible for the incredible increments in performance witnessed over the past decades. To ...

What is Block Copolymer Lithography? Block copolymer lithography is a nanofabrication technique that utilizes the self-assembly properties of block copolymers to create ordered nanostructures. Block ...

Block copolymer thin films lie at the forefront of nanomaterials research, merging precise molecular design with self-assembly processes to yield highly ordered nanostructures. By utilising chemically ...

A new technical paper titled “Directed self-assembly of block copolymers for high-precision patterning in the era of extreme ultraviolet lithography” was published by researchers at University of ...

Inspired by jigsaw puzzles, Prof. ZHAO Yanchuan and his research team from the Shanghai Institute of Organic Chemistry (SIOC) of the Chinese Academy of Sciences have developed a stable, porous ...

Chemists are exploring a new method for designing materials, and it’s called shape-directed self-assembly. A research team at Seoul National University created saddle-shaped molecules that stacked ...

“Directed self-assembly (DSA) of block copolymers (BCPs) has long been included in the semiconductor roadmap as a lithographic pathway to enable continued device scaling. Tremendous progress has been ...