TOKYO--(BUSINESS WIRE)--Shin-Etsu Chemical Co., Ltd. (TOKYO: 4063) (Head Office: Tokyo; President: Yasuhiko Saitoh; hereinafter, “Shin-Etsu Chemical”) has developed equipment to manufacture ...

Producing high-purity wafers via the CMP process is a critical application and the halting of harmful slurry-DIW ...

As semiconductor devices become more complex and the critical particle size for today’s cutting-edge technology nodes falls into the sub-10 nm size range, controlling and mitigating potentially ...

In response to the rising focus on sustainable manufacturing practices and corporate social responsibility, there has been a surge of interest in adopting environmentally friendly and green chemicals ...