The semiconductor industry, constrained by the protracted delay in the introduction of next-generation lithography, has had to extend optical lithography below the 100-nanometer node by adopting ...

Metrology giant KLA-Tencor today introduced what it calls Process Window Qualification (PWQ), a reticle design verification system designed for sub 0.10-micron designs, the company said. Combining ...

In moving to nanometer process technologies at 130 nm and below, semiconductor designers face a variety of physical and electrical effects that can significantly degrade circuit performance. For these ...