Abstract: In this letter, we apply an oxidation technique for p-GaN to a normally-off p-GaN /AlGaN/GaN HEMT to improve the threshold voltage and gate reliability. Oxygen-plasma and low-temperature ...
Abstract: In this article, we demonstrate a novel E-mode HEMT featuring in situ AlN dielectric layer on p-GaN cap layer. Compared with conventional p-GaN gate HEMT, the threshold voltage of in situ ...
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