A new technical paper titled “Scanning electron microscopy-based automatic defect inspection for semiconductor manufacturing: a systematic review” was published by researchers at KU Leuven and imec.

A recent study published in the Journal of Geophysical Research: Machine Learning and Computation presents a new image enhancement process for scanning electron microscopy (SEM) data sets, called Deep ...

Advantest will initially target the E3660 for deployment at Merchant Mask Shops, where commercial mask manufacturers produce masks for external customers, and Captive Mask Shops, ...