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Abstract: The double radio frequency inductively coupled plasma-enhanced chemical vapor deposition (Dual RF-ICP-enhanced CVD) is a crucial technique for preparing diamond, the ultimate semiconductor.

In 2024, the Direct RF Generator held the most market share for RF plasma generators because of its ease of use, dependability, and strong demand across a range of applications, such as surface ...

Abstract: A plasma jet generator based on piezoelectric transformer is designed in this paper. Different from the past, This paper used selective harmonic control method, which can control the ...